Integrated circuit device and method of manufacturing the same

ABSTRACT

An integrated circuit device includes a device isolation trench defining an active area, a gate trench extending in a first direction across the active area and the device isolation film, a gate dielectric film covering an inner wall of the gate trench, and a conductive line filling a part of the gate trench above the gate dielectric film. The active area includes a fin body portion located under the conductive line, and a thinner fin portion protruding from the fin body portion toward the conductive line and having a width less than a width of the fin body portion in the first direction.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Divisional Application of U.S. application Ser.No. 16/111,643, filed on Aug. 24, 2018, which claims the benefit ofKorean Patent Application No. 10-2018-0006627, filed on Jan. 18, 2018,in the Korean Intellectual Property Office, the disclosure of which isincorporated herein in its entirety by reference.

BACKGROUND

The inventive concepts relate to an integrated circuit device, andparticularly, to an integrated circuit device having a buried word lineand a method of manufacturing the same.

As a degree of integration of an integrated circuit device that forms aburied channel array transistor (BCAT) having a plurality of word linesburied in a substrate increases, the pitch of a plurality of activeareas and/or the pitch of a plurality of word lines gradually decreases,which may have an adverse effect on the refresh characteristics of theintegrated circuit device. Accordingly, in order to improve thecharacteristics of a cell drive current by more accurately controlling athreshold voltage of a gate electrode and/or improving the offcharacteristics of a cell transistor, a variety of technologies toextend the channel width of a transistor have been suggested. However,there is a limitation in securing a deposition process margin to fill aspace between neighboring active areas with desired materials without adeposition defect such as a seam or a void, due to a decreased intervalbetween the active areas.

SUMMARY

The inventive concepts effectively extend the channel width whileovercoming deposition defect problems due to a decreased intervalbetween active areas.

The inventive concepts provide an integrated circuit device having astructure which may extend the channel width of a cell transistor and/orimprove the characteristics of a cell drive current, even when the sizeof a cell transistor area decreases and/or the pitch of a plurality ofactive areas decreases according to downscaling of an integrated circuitdevice including a buried channel array transistor (BCAT).

The inventive concepts provide a method of manufacturing an integratedcircuit device which may extend the channel width of a cell transistorwhile overcoming a deposition defect problem due to a decreased intervalbetween active areas, even when the size of a cell transistor areadecreases and/or the pitch of a plurality of active areas decreasesaccording to downscaling of an integrated circuit device including aBCAT.

According to an aspect of the inventive concepts, there is provided anintegrated circuit device including a substrate in which a deviceisolation trench that defines an active area is formed, a deviceisolation film filling the device isolation trench around the activearea, a gate trench extending in a first direction across the activearea and the device isolation film, a gate dielectric film covering aninner wall of the gate trench, and a conductive line filling a part ofthe gate trench above the gate dielectric film, in which the active areacomprises a fin body portion located under the conductive line, and athinner fin portion protruding from the fin body portion toward theconductive line and having a width less than a width of the fin bodyportion in the first direction.

According to another aspect of the inventive concepts, there is providedan integrated circuit device including a substrate having a plurality ofactive areas that are arranged in a row in a first direction, a deviceisolation film surrounding the plurality of active areas on thesubstrate, and a conductive line extending across the plurality ofactive areas in the substrate, in which each of the plurality of activeareas comprises a fin body portion located under the conductive line anda thinner fin portion protruding from the fin body portion toward theconductive line and having a width less than a width of the fin bodyportion in the first direction.

According to another aspect of the inventive concepts, there is providedan integrated circuit device including a substrate having a cell arrayarea, a peripheral circuit area, and an interface area between the cellarray area and the peripheral circuit area, a plurality of active areasdefined in the substrate in the cell array area, a device isolation filmcovering a side wall of each of the plurality of active areas in thecell array area, an interface device isolation film filling an interfacetrench formed in the substrate in the interface area, and a plurality ofconductive lines extending in the cell array area across the pluralityof active areas in a first direction, in which each of the plurality ofactive areas comprises a fin body portion located under the conductiveline and a thinner fin portion protruding from the fin body portiontoward the conductive line and having a width less than a width of thefin body portion in the first direction.

According to another aspect of the inventive concepts, there is provideda method of manufacturing an integrated circuit device, which includesforming, by etching a substrate, a device isolation trench including anextended trench area at a level lower than a first depth from a topsurface of the substrate, and defining, in the substrate, a plurality ofactive areas, each of the plurality of active areas including a fin bodyportion having a first width at a level lower than a level of theextended trench area and a middle active area defined by the extendedtrench area and having a second width less than the first width, forminga device isolation film in the device isolation trench, forming a gatetrench extending in a first direction across the plurality of activeareas and the device isolation film by removing parts of the pluralityof active areas and a part of the device isolation film, andsimultaneously forming, in each of the plurality of active areas, athinner fin portion protruding from the fin body portion and having awidth less than a width of the fin body portion in the first direction,forming, in the gate trench, a gate dielectric film covering the deviceisolation film and the thinner fin portion, and forming a conductiveline above the gate dielectric film in the gate trench.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the inventive concepts will be more clearly understoodfrom the following detailed description taken in conjunction with theaccompanying drawings in which:

FIG. 1 is a schematic plan view of a configuration of an integratedcircuit device according to an embodiment;

FIG. 2 is a block diagram of an example configuration of an integratedcircuit device formed as a DRAM device;

FIG. 3 is a schematic plan view of a configuration of an integratedcircuit device according to another embodiment;

FIG. 4 is a schematic planar layout for explaining main configurationsof a memory cell array area shown in FIG. 3 ;

FIGS. 5A to 5C illustrate main configurations of an integrated circuitdevice according to an embodiment, in which FIG. 5A is a cross-sectionalview of some configurations, taken along line A-A′ of FIG. 4 , FIG. 5Bis a cross-sectional view of some configurations, taken along line B-B′of FIG. 4 , and FIG. 5C is a cross-sectional view of someconfigurations, taken along line C-C′ of FIG. 4 ;

FIG. 6 is an enlarged cross-sectional view of a portion X1 of FIG. 5A;

FIG. 7 is a cross-sectional view of main configurations of an integratedcircuit device according to another embodiment;

FIGS. 8A and 8B are cross-sectional views of main configurations of anintegrated circuit device according to another embodiment;

FIG. 9 is a cross-sectional view of main configurations of an integratedcircuit device according to another embodiment; and

FIGS. 10A to 10F are cross-sectional views showing a method ofmanufacturing an integrated circuit device, according to an embodiment,in a process order.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

FIG. 1 is a schematic plan view of a configuration of an integratedcircuit device 10 according to an embodiment.

The integrated circuit device 10 may have a substrate 12 including afirst area 22, a second area 24 surrounding the first area 22, and/or aninterface area 26 provided between the first area 22 and the second area24.

The substrate 12 may include, for example, a semiconductor element suchas Si or Ge, or at least one compound semiconductor selected from SiGe,SiC, GaAs, InAs, and InP. The substrate 12 may include a conductivearea, for example, a well doped with impurities or a structure dopedwith impurities.

In some embodiments, the first area 22 may be a memory cell area of theintegrated circuit device 10. In some embodiments, the first area 22 maybe a memory cell area of dynamic random access memory (DRAM). The firstarea 22 may include a unit memory cell having a transistor and acapacitor, or a unit memory cell having a switching device and avariable resistor.

The second area 24 may be a core area or a peripheral circuit area(hereinafter, referred to as the “peripheral circuit area”). Peripheralcircuits for driving memory cells in the first area 22 may be arrangedin the second area 24.

A plurality of conductive lines for electrical connection between thefirst area 22 and the second area 24, and a plurality of insulatingstructures for insulation between the first area 22 and the second area24, may be arranged in the interface area 26.

FIG. 2 is a block diagram of an example configuration of an integratedcircuit device formed as a DRAM device.

Referring to FIG. 2 , in the integrated circuit device 10, the firstarea 22 may be a memory cell area of a DRAM device, and the second area24 may be a peripheral circuit area of the DRAM device. The first area22 may include a memory cell array 22A. In the memory cell array 22A, aplurality of memory cells for storing data may be arranged in a rowdirection and a column direction. Each of the memory cells may include acell capacitor and an access transistor. A gate of an access transistormay be connected to a corresponding word line of a plurality of wordlines arranged in the row direction. One of a source and a drain of theaccess transistor may be connected to a bit line or a complementary bitline arranged in the column direction, and the other one of the sourceand the drain may be connected to a cell capacitor.

The second area 24 may include a row decoder 52, a sense amplifier 54, acolumn decoder 56, a self-refresh control circuit 58, a command decoder60, a mode register set/extended mode register set (MRS/EMRS) circuit62, an address buffer 64, and/or a data input/output circuit 66.

The sense amplifier 54 may sense and amplify data of a memory cell andstore the data in a memory cell. The sense amplifier 54 may beimplemented by a cross-coupled amplifier connected between the bit lineand the complementary bit line included in the memory cell array 22A.

Data DQ input through the data input/output circuit 66 may be written tothe memory cell array 22A based on an address signal ADD. The data DQread from the memory cell array 22A based on the address signal ADD maybe output to the outside through the data input/output circuit 66. Theaddress signal ADD may be input to the address buffer 64 to designate amemory cell to write or read data. The address buffer 64 may temporarilystore the address signal ADD that is externally input.

The row decoder 52 may decode a row address of the address signal ADDoutput from the address buffer 64 to designate a word line connected tothe memory cell to write or read data. In other words, the row decoder52, in a data write or read mode, may enable an appropriate word line bydecoding a row address output from the address buffer 64. Furthermore,the row decoder 52, in a self-refresh mode, may enable an appropriateword line by decoding a row address generated from an address counter.

The column decoder 56 may decode a column address of the address signalADD output from the address buffer 64, to designate a bit line connectedto the memory cell to write or read data. The memory cell array 22A mayoutput data from, or write data to, a memory cell designated by the rowand column addresses.

The command decoder 60 may receive a command signal CMD that isexternally applied, and may decode the signal to internally generate adecoded command signal, for example, a self-refresh entrance command ora self-refresh exit command.

The MRS/EMRS circuit 62 may set an internal mode register in response toa MRS/EMRS command and the address signal ADD to designate an operationmode of the integrated circuit device 10.

Although not illustrated in FIG. 2 , the integrated circuit device 10may further include a clock circuit for generating a clock signal,and/or a power circuit for receiving an externally applied power voltageand generating or distributing an internal voltage, etc.

The self-refresh control circuit 58 may control a self-refresh operationof the integrated circuit device 10 in response to a command output fromthe command decoder 60. The command decoder 60 may include an addresscounter, a timer, and/or a core voltage generator. The address countermay generate a row address to designate a row address that is subject tothe self-refresh and apply the generated row address to the row decoder52, in response to a self-refresh entrance command output from thecommand decoder 60. The address counter may stop a counting operation inresponse to the self-refresh exit command output from the commanddecoder 60.

FIG. 3 is a schematic plan view of a configuration of an integratedcircuit device 70 according to another embodiment. In FIGS. 1 and 3 ,like reference numerals denote like constituent elements, and thusredundant descriptions thereof are omitted.

Referring to FIG. 3 , the integrated circuit device 70 may include aplurality of the first areas 22. The first areas 22 may be surrounded bythe second area 24 with the interface area 26 therebetween. In theintegrated circuit device 70, each of the first areas 22 may be a memorycell array area (MCA) of the DRAM device, and the second area 24 may bea peripheral circuit area of the DRAM device.

In the first areas 22, the MCA may include the memory cell array 22Adescribed with reference to FIG. 2 . Each of the first areas 22 may besurrounded by the interface area 26.

The second area 24 may include a sub-word line driver block SWD, a senseamplifier block S/A, and a conjunction block CJT. In the second area 24,a plurality of sub-word line driver blocks SWD may be arranged in a wordline direction of the MCA, and a plurality of sense amplifier blocks S/Amay be arranged in a bit line direction. A plurality of bit-line senseamplifiers may be arranged in the sense amplifier block S/A. Theconjunction block CJT may be arranged at a position where the sub-wordline driver block SWD and the sense amplifier block S/A intersect witheach other. Power drivers for driving the bit-line sense amplifiers andground drivers may be alternately arranged in the conjunction block CJT.

Although not illustrated in FIG. 3 , a peripheral circuit such as aninverter chain, an input/output circuit, etc. may be further formed inthe second area 24.

FIG. 4 is a schematic planar layout for explaining main configurationsof an MCA shown in FIG. 3 .

Referring to FIG. 4 , the MCA may include a plurality of active areasA1. The active areas A1 may be arranged to have a major axis extendingin an inclined direction (Q direction) with respect to a first direction(X direction) and a second direction (Y direction). Some of the activeareas A1 may be arranged linearly in the first direction (X direction).Some other of the active areas A1 may be arranged linearly along thesecond direction (Y direction).

A plurality of word lines WL may parallelly extend in the firstdirection (X direction) across the active areas A1. A plurality of bitlines BL may parallelly extend, above the word lines WL, in the seconddirection (Y direction) crossing the first direction (X direction). Thebit lines BL may be connected to the active areas A1 via a directcontact (DC).

A plurality of buried contacts BC may be formed between two adjacent bitlines BL of the plurality of bit lines BL. The buried contacts BC may bearranged linearly in the first direction (X direction) and the seconddirection (Y direction). A plurality of landing pads LP may be formed onthe buried contacts BC. The buried contacts BC and the landing pads LPmay connect a lower electrode (not shown) of a capacitor formed abovethe bit lines BL to the active areas A1. Each of the landing pads LP maybe arranged to partially overlap the buried contacts BC.

FIGS. 5A to 5C illustrate main configurations of an integrated circuitdevice 100 according to an embodiment, in which FIG. 5A is across-sectional view of some configurations, taken along line A-A′ ofFIG. 4 , FIG. 5B is a cross-sectional view of some configurations, takenalong line B-B′ of FIG. 4 , and FIG. 5C is a cross-sectional view ofsome configurations, taken along line C-C′ of FIG. 4 ; In FIGS. 4 and 5Ato 5C, like reference numerals denote like constituent elements, andthus redundant descriptions thereof are omitted.

Referring to FIGS. 5A to 5C, the integrated circuit device 100 may forma part of the MCA of FIG. 3 , and may have the planar layout of FIG. 4 .

The integrated circuit device 100 may include a substrate 110 in which adevice isolation trench 112T for defining the active areas A1 is formed.A device isolation film 112 filling the device isolation trench 112T isformed around the active areas A1 on the substrate 110.

The substrate 110 may have the same configuration as the substrate 12described with reference to FIG. 1 .

The active areas A1, as illustrated in FIG. 4 , may be repeatedly formedby being spaced apart from each other in the X direction and Ydirection. Each of the active areas A1 may have a shape extending in aninclined direction to have a major axis extending in another direction(Q direction in FIG. 4 ) different from the X direction and the Ydirection.

The device isolation film 112 may formed in a silicon oxide film, asilicon nitride film, or a combination thereof.

A plurality of gate trenches GT extending in the first direction (Xdirection) across the active areas A1 and the device isolation film 112are formed in the active areas A1 and the device isolation film 112. Thegate trenches GT may have a shape of a plurality of lines parallellyextending in the X direction.

A gate dielectric film 120 covering an inner wall of each of the gatetrenches GT, and a conductive line 130 filling a part of each of thegate trenches GT above the gate dielectric film 120, are formed in eachof the gate trenches GT. The conductive line 130 may form the word lineWL of FIG. 4 . An insulating capping pattern 170 covering the conductiveline 130 may be formed in each of the gate trenches GT.

On a lower surface of each of the gate trenches GT, a level of a portionwhere the active areas A1 of the substrate 110 are exposed may be higherthan a level of a portion where the device isolation film 112 isexposed. The lower surface of the conductive line 130 may have an unevenshape corresponding to a lower surface profile of each of the gatetrenches GT, and a saddle FINFET structure may be formed on the activeareas A1. In the present specification, the term “level” may signify aheight in a vertical direction (Z direction).

FIG. 6 is an enlarged cross-sectional view of a portion X1 of FIG. 5A.

Referring to FIGS. 5A to 5C and FIG. 6 , each of the active areas A1 mayinclude a fin body portion FB located under the conductive line 130, anda thinner fin portion TF integrally connected to the fin body portion FBand upwardly protruding from the fin body portion FB toward theconductive line 130 in a vertical direction (Z direction). The thinnerfin portion TF has a width in the first direction (X direction) that isless than a width of the fin body portion FB. Accordingly, a distance L1between the thinner fin portions TF of the two neighboring active areasA1 in the first direction (X direction) is greater than a distance L2between the fin body portions FB of the two neighboring active areas A1.As illustrated in FIGS. 5A and 6 , the thinner fin portion TF may have around top portion, but the present inventive concepts is not limitedthereto. The shape of the top portion of the thinner fin portion TF maybe variously changed within the scope of the technical concepts of thepresent inventive concepts, and a detailed example thereof is describedlater with reference to FIG. 9 . Similarly, the overall profile of thethinner fin portion TF and the fin body portions FB may be any overallprofile that results in the distance L1 between the thinner fin portionsTF of two neighboring active areas A1 in the first direction (Xdirection) to be greater than a distance L2 between the fin bodyportions FB of the two neighboring active areas A1.

Each of the gate trenches GT may include a first bottom GTB1 where thedevice isolation film 112 is exposed and a second bottom GTB2 where asurface of the thinner fin portion TF and an upper surface of the finbody portion FB are exposed. The first bottom GTB1 may be located at alevel lower than the second bottom GTB2.

A thickness TH1 of the conductive line 130 on the first bottom GTB1 ofeach of the gate trenches GT may be greater than a thickness TH2 of theconductive line 130 on the second bottom GTB2 of each of the gatetrenches GT.

The gate dielectric film 120 may cover an inner surface of each of thegate trenches GT to contact the active areas A1 and the device isolationfilm 112. The gate dielectric film 120 may contact the surface of thethinner fin portion TF and the upper surface of the fin body portion FB,above the active areas A1.

The gate dielectric film 120 may be formed in a silicon oxide film, asilicon nitride film, a silicon oxynitride film, an oxide/nitride/oxide(ONO) film, or a high-k dielectric film having a dielectric constanthigher than that of a silicon oxide film. The high-k dielectric film mayhave a dielectric constant of about 10-25, and may include, for example,HfO2, Al2O3, HfAl3, Ta2O3, or TiO2.

The conductive line 130 may be formed of metal, a metal nitride, a metalcarbide, or a combination thereof. In some embodiments, the conductiveline 130 may be formed of Ti, TiN, Ta, TaN, W, WN, TiSiN, WSiN, or acombination thereof.

The insulating capping pattern 170 may be formed in a silicon nitridefilm, a silicon oxynitride film, a silicon oxide film, or a combinationthereof.

As illustrated in FIG. 5A, the conductive line 130 may include a recessbottom 130R surrounding the thinner fin portion TF.

As illustrated in FIGS. 5B and 5C, each of the active areas A1 may havea side wall in which a lateral recess 110AR is formed. The lateralrecess 110AR may be formed at an approximately same level as that of thethinner fin portion TF. The lateral recess 110AR may have a shapeextending long in a horizontal direction along a circumferentialdirection of the active areas A1.

Each of the active areas A1 may further include an upper active area UAand a middle active area MA. The middle active area MA may be connectedbetween the fin body portion FB and the upper active area UA. In theactive areas A1, at least a lower portion of the middle active area MAmay be located at the same level as that of the thinner fin portion TF.In the horizontal direction, a width of the middle active area MA may beless than the width of the fin body portion FB and a width of the upperactive area UA.

The device isolation film 112 may have a side wall on which a laterallyprotruding insulation portion 112PR protruding toward the lateral recess110AR of the active areas A1 is formed. The side wall of the deviceisolation film 112 may include portions 112P1, 112P2, and 112P3 having apositive profile such that a width of the device isolation film 112 inthe horizontal direction increases toward the uppermost surface of theactive areas A1, that is, a top surface 110T of the substrate 110, and aportion 112N having a negative profile such that the width of the deviceisolation film 112 in the horizontal direction decreases toward the topsurface 110T of the substrate 110.

As illustrated in FIG. 5C, the conductive lines 130 each may have sidewalls facing the active areas A1. The insulating capping pattern 170 mayhave side walls facing the active areas A1. A source/drain area SD maybe formed at both sides of the conductive line 130 in the active areasA1. A top surface 130T of the conductive line 130 may be located at alevel lower than the uppermost surface of the active areas A1, that is,the top surface 110T of the substrate 110.

In some embodiments, the integrated circuit device 100 may furtherinclude an insulating thin film 114 (see FIG. 10F) covering the topsurface 110T of the substrate 110. The insulating thin film 114 may beformed of the same material as the insulation material forming thedevice isolation film 112.

FIG. 7 is a cross-sectional view of main configurations of an integratedcircuit device 200 according to another embodiment. An areacorresponding to a portion X2 of FIG. 5C is illustrated enlarged in FIG.7 . In FIGS. 5A to 5C and FIG. 7 , like reference numerals denote likeconstituent elements, and thus redundant descriptions thereof areomitted.

Referring to FIG. 7 , the integrated circuit device 200 hasapproximately the same configuration as the integrated circuit device100 illustrated in FIGS. 5A to 5C. However, the integrated circuitdevice 200 may include a device isolation film 212 having a multilayerstructure, instead of the device isolation film 112 of the integratedcircuit device 100.

The device isolation film 212 may include a first insulating liner 212A,a second insulating liner 212B, and/or a gap-fill insulating film 212Cwhich are sequentially formed in the device isolation trench 112T. Inthe device isolation trench 112T, the first insulating liner 212A andthe second insulating liner 212B may have a structure surrounding thegap-fill insulating film 212C. In some embodiments, although the firstinsulating liner 212A and the gap-fill insulating film 212C may beformed in a silicon oxide film, and the second insulating liner 212B isformed in a silicon nitride film, materials forming the first insulatingliner 212A, the second insulating liner 212B, and/or the gap-fillinsulating film 212C are not limited to the above descriptions.

The device isolation film 212 may have a side wall on which a laterallyprotruding insulation portion 212PR protruding toward the lateral recess110AR of the active areas A1 is formed. The side wall of the deviceisolation film 212 may include portions 212P1 and 212P2 having apositive profile such that a width of the device isolation film 212 inthe horizontal direction increases toward the top surface 110T of thesubstrate 110 (see FIG. 5C), and a portion 212N having a negativeprofile such that a width of the device isolation film 212 in thehorizontal direction decreases toward the top surface 110T of thesubstrate 110.

FIGS. 8A and 8B are cross-sectional views of main configurations of anintegrated circuit device 300 according to another embodiment. FIGS. 8Aand 8B illustrate sectional configurations of a cell array area 322, aperipheral circuit area 324, and an interface area 326. The cell arrayarea 322 may be a part of the first area 22 described with reference toFIGS. 1 to 3 . The peripheral circuit area 324 and the interface area326 may be parts of the second area 24 and the interface area 26described with reference to FIGS. 1 and 3 , respectively.

A sectional configuration illustrated in FIG. 8A may correspond to apartial area of the section taken along the line A-A′ of FIG. 4 and to apartial area of the interface area 326 adjacent thereto, and a sectionalconfiguration illustrated in FIG. 8B may correspond to a partial area ofthe section taken along the line C-C′ of FIG. 4 and to a partial area ofthe interface area 326 adjacent thereto.

In FIGS. 8A and 8B and FIGS. 5A to 5C, like reference numerals denotelike constituent elements, and thus redundant descriptions thereof areomitted.

Referring to FIGS. 8A and 8B, the integrated circuit device 300 haveapproximately the same configuration as the integrated circuit device100 illustrated in FIGS. 5A to 5C. However, the integrated circuitdevice 300 may further include an interface device isolation film 312filling an interface trench 312T that is formed in the substrate 110 inthe interface area 326.

An active area A2 may be defined in the peripheral circuit area 324 ofthe substrate 110 by the interface trench 312T and the interface deviceisolation film 312.

As illustrated in FIG. 8B, in the peripheral circuit area 324, theactive area A2 may have a side wall in which a lateral recess 310AR isformed. The lateral recess 310AR may be formed at an approximately samelevel as that of the thinner fin portion TF included in the active areasA1 of the cell array area 322. The lateral recess 310AR in the activearea A2 of the peripheral circuit area 324 may have a shape that extendslong in the horizontal direction along the circumferential direction ofthe active area A2.

The interface device isolation film 312 may have a side wall on which alaterally protruding insulation portion 312PR protruding toward thelateral recess 310AR of the active area A2 in the peripheral circuitarea 324 is formed. The laterally protruding insulation portion 312PRmay include a portion protruding toward the lateral recess 110AR of theactive areas A1, and a portion protruding toward the lateral recess310AR of the active area A2.

The side wall of the interface device isolation film 312 may include aportion 312N having a negative profile such that a width of theinterface device isolation film 312 in the horizontal directiondecreases toward the top surface 110T of the substrate 110.

The interface device isolation film 312 may extend along the peripheryof the cell array area 322 to have a shape surrounding the cell arrayarea 322 when seen in the planar view. A with of the interface deviceisolation film 312 in the horizontal direction may be greater than awidth of the device isolation film 112 arranged in the cell array area322 in the horizontal direction.

In the interface area 326, the interface device isolation film 312 mayinclude a first insulating liner 312A, a second insulating liner 312B,and a gap-fill insulating film 312C filling the interface trench 312T inthe second insulating liner 312B, which are sequentially formed on aninner wall of the interface trench 312T.

In the cell array area 322, a part of the device isolation film 112 mayhave a structure in which a first insulating film 112A and a secondinsulating film 112B are sequentially stacked. In the device isolationtrench 112T, an area having a relatively narrow width in the horizontaldirection may be filled with the first insulating film 112A only, and anarea having a relatively large width in the horizontal direction may befilled with the first insulating film 112A and the second insulatingfilm 112B. The first insulating film 112A forming the device isolationfilm 112 may be formed of the same material as the first insulatingliner 312A forming the interface device isolation film 312. The secondinsulating film 112B forming the device isolation film 112 may be formedof the same material as the second insulating liner 312B forming theinterface device isolation film 312.

As illustrated in FIG. 8B, the laterally protruding insulation portion312PR formed on the side wall of the interface device isolation film 312may be a part of the first insulating liner 312A. The second insulatingliner 312B of the interface device isolation film 312 may include aprotruding portion BAR. The protruding portion BAR may protrude towardthe laterally protruding insulation portion 312PR and extend long alongthe circumferential direction of the second insulating liner 312B at anapproximately same level as the thinner fin portion TF included in theactive areas A1 of the cell array area 322. The protruding portion BARmay include a portion protruding toward the lateral recess 110AR of theactive areas A1, a portion protruding toward the thinner fin portion TFof the active areas A1, and a portion protruding toward the lateralrecess 310AR of the active area A2. The gap-fill insulating film 312C ofthe interface device isolation film 312 may include a protruding portionCAR. The protruding portion CAR may protrude toward the laterallyprotruding insulation portion 312PR and extend long in the horizontaldirection along the circumferential direction of the gap-fill insulatingfilm 312C at an approximately same level as the thinner fin portion TFincluded in the active areas A1 of the cell array area 322. Theprotruding portion CAR may include a portion protruding toward thelateral recess 110AR of the active areas A1, a portion protruding towardthe thinner fin portion TF of the active areas A1, and a portionprotruding toward the lateral recess 310AR of the active area A2.

In some embodiments, each of the first insulating film 112A, the firstinsulating liner 312A, and the gap-fill insulating film 312C may beformed in an oxide film, and the second insulating film 112B and thesecond insulating liner 312B may be formed in a nitride film. In someembodiments, the oxide film forming the first insulating film 112A andthe first insulating liner 312A may be a silicon oxide film formed by anatomic layer deposition (ALD) process. In some embodiments, the secondinsulating film 112B and the second insulating liner 312B may be asilicon nitride film. In some embodiments, the silicon oxide filmforming the gap-fill insulating film 312C may be a tonen silazene (TOSZ)oxide film, a high density plasma (HDP) oxide film, or an undopedsilicate glass (USG) oxide film. In other embodiments, the oxide filmforming the gap-fill insulating film 312C may be a spin-on-glass (SOG)oxide film including silicate, siloxane, methyl silsesquioxane (MSQ),hydrogen silsesquioxane (HSQ), polysilazane, or a combination thereof.

FIG. 9 is a cross-sectional view of main configurations of an integratedcircuit device 400 according to another embodiment. A portioncorresponding to the portion X1 of FIG. 5A is illustrated enlarged inFIG. 9 . In FIG. 9 and FIGS. 5A to 5C, like reference numerals denotelike constituent elements, and thus redundant descriptions thereof areomitted.

Referring to FIG. 9 , the integrated circuit device 400 hasapproximately the same configuration as the integrated circuit device100 illustrated in FIGS. 5A to 5C. However, an active area 402A1 of theintegrated circuit device 400 may have a thinner fin portion 402TFhaving a top surface 402T that is flat, instead of the thinner finportion TF of FIG. 5A and FIG. 6 . A detailed configuration of theactive area 402A1 having the thinner fin portion 402TF is approximatelythe same as that of the active areas A1 having the thinner fin portionTF described with reference to FIG. 5A to FIG. 6 .

FIGS. 10A to 10F are cross-sectional views showing a method ofmanufacturing an integrated circuit device according to an embodiment,in a process order. A method of manufacturing the integrated circuitdevice 300 of FIGS. 8A and 8B is exemplarily described with reference toFIGS. 10A to 10F.

Referring to FIG. 10A, the substrate 110 including the cell array area322, the peripheral circuit area 324, and the interface area 326therebetween is prepared.

A mask pattern M1 is formed on the substrate 110. In the cell array area322, the device isolation trench 112T is formed in the substrate 110 andthe interface trench 312T is formed in the substrate 110 by etching thesubstrate 110 by using the mask pattern M1 as an etch mask. The activeareas A1 may be defined in the cell array area 322 and the active areaA2 may be defined in the peripheral circuit area 324, by the deviceisolation trench 112T and the interface trench 312T.

The mask pattern M1 may be formed to cover a part of the cell array area322 and the peripheral circuit area 324. The mask pattern M1 may be ahard mark including an oxide film, a polysilicon film, or a combinationthereof.

Each of the device isolation trench 112T and the interface trench 312Tmay be formed to include trench areas ET1 and ET2 extending from the topsurface 110T of the substrate 110 to a level of a certain depth.

In some embodiments, the extended trench areas ET1 and ET2 may be formedat a level lower than a first depth D1 from the top surface 110T of thesubstrate 110. In some embodiments, to form the device isolation trench112T and the interface trench 312T including the extended trench areasET1 and ET2, upper device isolation trench areas UT1 and UT2 may beformed by performing an anisotropic etching process on the substrate 110to a first level LV31 that is the first depth D1 from the top surface110T of the substrate 110. Each of the upper device isolation trenchareas UT1 and UT2 may have a side wall having a positive profile suchthat a width of each of the upper device isolation trench areas UT1 andUT2 in the horizontal direction increases toward the top surface 110T ofthe substrate 110. Next, from the first level LV31 to a second levelLV32 that is a second depth D2 deeper than the first depth D1 from thetop surface 110T of the substrate 110, the extended trench areas ET1 andET2 may be formed by performing an isotropic etching process on thesubstrate 110. Each of the extended trench areas ET1 and ET2 may includea portion having a negative profile such that a width of each of theextended trench areas ET1 and ET2 in the horizontal direction decreasestoward the top surface 110T of the substrate 110. Then, lower deviceisolation trench areas LT1 and LT2 may be formed by performing ananisotropic etching process on the substrate 110 from the second levelLV32 until the formation of the device isolation trench 112T and theinterface trench 312T is completed. Each of the lower device isolationtrench areas LT1 and LT2 may have a side wall having a positive profilesuch that a width of each of the lower device isolation trench areas LT1and LT2 in the horizontal direction increases toward the top surface110T of the substrate 110.

The anisotropic etching process and the isotropic etching process eachmay be performed in a dry method. In some embodiments, when thesubstrate 110 is formed of silicon (Si), an etching apparatus usinginductively coupled plasma (ICP) may be used to perform the anisotropicetching process and the isotropic etching process. For example, theanisotropic etching process may be performed by using plasma obtainedfrom a Cl2 gas. The isotropic etching process may be performed by usingplasma obtained from a mixed gas of a Cl2 gas and a NF3 gas. The mixedgas may be a gas obtained by mixing a Cl2 gas and an NF3 gas at a volumeratio of about 5:1. The isotropic etching process for forming theextended trench areas ET1 and ET2 may use a higher pressure and a lowerbias voltage than those used for the anisotropic etching process forforming the upper device isolation trench areas UT1 and UT2 and thelower device isolation trench areas LT1 and LT2. For example, a pressureof about 3 mT, a source power of about 300 W, and a bias voltage ofabout 850 V are used during the anisotropic etching process, and apressure of about 20 mT, a source power of about 600 W, and a biasvoltage of about 0 V may be used during the isotropic etching process.However, these are examples, and the technical concepts of the presentinventive concepts are not limited thereto.

In some embodiments, while the anisotropic etching process and theisotropic etching process are performed, a cycle process in which anoxidation process for oxidizing an exposed surface of the substrate 110,and an etching process for removing a part of the substrate 110 to formthe device isolation trench 112T and the interface trench 312T arealternatively repeated a plurality of times, may be performed.

After the device isolation trench 112T and the interface trench 312T areformed in the substrate 110, in the cell array area 322, each of theactive areas A1 may include the fin body portion FB, the middle activearea MA, and the upper active area UA. In some embodiments, in ahorizontal direction, a width W1 of the middle active area MA may beless than a width W2 of the upper active area UA and greater than ½ ofthe width W2 of the upper active area UA.

Referring to FIG. 10B, from a resultant of FIG. 10A, after the maskpattern M1 is removed, the device isolation film 112 filling the deviceisolation trench 112T and the interface device isolation film 312filling the interface trench 312T are formed.

The device isolation film 112 and the interface device isolation film312 may include the insulating thin film 114 covering the top surface110T of the substrate 110. The insulating thin film 114 remaining on thetop surface 110T of the substrate 110 may protect the surface of thesubstrate 110 in a subsequent process when an ion injection process toinject impurity ions into the substrate 110 is performed, or during asubsequent etching process.

Referring to FIG. 10C, each of the gate trenches GT extending in thefirst direction (X direction) across the active areas A1, the deviceisolation film 112, and the interface device isolation film 312 isformed by etching a part of the substrate 110, a part of the deviceisolation film 112, and a part of the interface device isolation film312, by using a mask pattern M2 as an etch mask.

In order to form each of the gate trenches GT, from the top surface 110Tof the substrate 110 to the first level LV31 (see FIG. 10A) that is thefirst depth D1, the substrate 110, the device isolation film 112, andthe interface device isolation film 312 may be etched at anapproximately same etching speed. In other words, in an area exposedthrough the mask pattern M2, the upper active area UA is removed fromthe active areas A1 from the top surface 110T of the substrate 110, andthe substrate 110, the device isolation film 112, and the interfacedevice isolation film 312 may be etched at an approximately same etchingspeed until a point when the middle active area MA is exposed. Next,from a point when the middle active area MA of each of the active areasA1 is exposed, the etching process may be performed on a condition thatan etching speed of the device isolation film 112 and the interfacedevice isolation film 312 is greater than an etching speed of thesubstrate 110. In this state, while the device isolation film 112 andthe interface device isolation film 312 are etched around the middleactive area MA, a part of an exposed surface of the middle active areaMA is further consumed, and thus the thinner fin portion TF may beformed. After each of the gate trenches GT is formed, the thinner finportion TF and the fin body portion FB of each of the active areas A1may be exposed from the bottom of each of the gate trenches GT. Each ofthe gate trenches GT may include the first bottom GTB1 where the deviceisolation film 112 is exposed, and the second bottom GTB2 where thesurface of the thinner fin portion TF and the upper surface of the finbody portion FB are exposed. The first bottom GTB1 may be located at alevel lower than the second bottom GTB2.

In some embodiments, by appropriately changing an etching atmosphereduring the process of etching the device isolation film 112 and theinterface device isolation film 312 around the middle active area MA,the thinner fin portion TF having a round top portion as illustrated inFIG. 10C or the thinner fin portion 402TF having the top surface 402Tthat is flat as illustrated in FIG. 9 may be formed.

The mask pattern M2 may be formed in an oxide film, an amorphous carbonlayer (ACL), a SiON film, or a combination thereof.

Referring to FIG. 10D, the gate dielectric film 120 conformally coveringthe inner wall of each of the gate trenches GT is formed on a resultantof FIG. 10C. The gate dielectric film 120 may be formed by using the ALDprocess.

Referring to FIG. 10E, after a conductive layer (not shown) filling eachof the gate trenches GT on the gate dielectric film 120 is formed, theconductive layer is etched back such that the conductive line 130filling a part of each of the gate trenches GT remains from theconductive layer.

The conductive layer may have a structure in which a metal containingliner and a metal film are sequentially stacked. The metal containingliner may contact the gate dielectric film 120. The metal film may bespaced apart from the gate dielectric film 120 and surrounded by themetal containing liner. In some embodiments, the metal containing linermay be formed of TiN, and the metal film may be formed of W, but thepresent inventive concept is not limited thereto.

In the active areas A1, the thinner fin portion TF having a width lessthan a width of the fin body portion FB protrudes to the inside of eachof the gate trenches GT. Accordingly, even when an interval between theactive areas A1 in the cell array area 322 decreases much as theintegrated circuit device is highly downscaled, a plurality of thethinner fin portion TF having a relatively small width protrudes to theinside of each of the gate trenches GT, and thus a space having arelatively large width may be secured between two neighboring thinnerfin portion TF of a plurality of the thinner fin portions TF.Accordingly, while the conductive layer is formed to form the conductiveline 130, the conductive layer may fill well, without a depositiondefect such as a seam or void, the space between the two neighboringthinner fin portions TF that is a relatively narrow space compacted toother portion of the inner space of each of the gate trenches GT.Accordingly, the defective deposition problem due to a narrow intervalbetween the active areas A1 may be addressed and an area where thethinner fin portion TF and the conductive line 130 face each other maybe effectively increased. As a result, a channel width of a transistorincluding the conductive line 130 may be effectively extended, and thusreliability of a device may be improved.

While the conductive layer is etched back to form the conductive line130, a part of the mask pattern M2 is consumed and thus the thickness ofthe mask pattern M2 may decrease.

Referring to FIG. 10F, in the inner space of each of the gate trenchesGT, a space remaining on the conductive line 130 is filled with theinsulating capping pattern 170. Next, the mask pattern M2 remaining onthe substrate 110 is removed, and the insulating thin film 114 coveringthe top surface 110T of the substrate 110 may be exposed.

In some embodiments, unlike the illustrated of FIG. 10F, while theinsulating thin film 114 covering the top surface 110T of the substrate110 remains, a planarization process is performed on the insulatingcapping pattern 170 and the insulating thin film 114 until the topsurface 110T of the substrate 110 is exposed, thereby obtaining aresultant as illustrated in FIG. 8A.

According to the method of manufacturing the integrated circuit device300 described with reference to FIGS. 10A to 10F, while the conductivelayer is formed to form the conductive line 130, the conductive layermay fill well, without a deposition defect, the relatively narrow spacebetween the two neighboring thinner fin portions TF in the inner spaceof each of the gate trenches GT, and thus the area where the thinner finportion TF and the conductive line 130 face each other may beeffectively increased. Accordingly, even when an area of the celltransistor area is reduced and a pitch of the active areas A1 decreasesdue to the downscaling of the integrated circuit device, the defectivedeposition problem due to the decreased interval between the activeareas A1 may be address, and thus the channel width of the celltransistor may be effectively extended.

As described above, although the method of manufacturing the integratedcircuit device 300 of FIGS. 8A and 8B is exemplarily described withreference to FIGS. 10A to 10F, by applying a variety of modificationsand changes thereto within a range of the technical concept of thepresent inventive concept, it would have been obvious to one of ordinaryskill in the art to manufacture the integrated circuit device 100described with reference to FIGS. 5A to 5C, the integrated circuitdevice 200 described with reference to FIG. 7 , the integrated circuitdevice 400 described with reference to FIG. 9 , or various integratedcircuit devices having a similar structure thereto, from thedescriptions with reference to FIGS. 10A to 10F.

While the inventive concept has been particularly shown and describedwith reference to embodiments thereof, it will be understood thatvarious changes in form and details may be made therein withoutdeparting from the spirit and scope of the following claims.

What is claimed is:
 1. An integrated circuit device comprising: asubstrate having a cell array area, a peripheral circuit area, and aninterface area between the cell array area and the peripheral circuitarea; a plurality of active areas in the substrate in the cell arrayarea; a device isolation film covering a side wall of each of theplurality of active areas in the cell array area; an interface deviceisolation film filling an interface trench formed in the substrate inthe interface area; and a plurality of conductive lines extending in thecell array area across the plurality of active areas in a firstdirection, wherein each of the plurality of active areas comprises a finbody portion located under the conductive lines and a thinner finportion protruding from the fin body portion toward the conductive lineand having a width less than a width of the fin body portion in thefirst direction, and wherein the interface device isolation film has aside wall on which a laterally protruding insulation portion is formed,the laterally protruding insulation portion extending long in ahorizontal direction at a same level as a level of the thinner finportion.
 2. The integrated circuit device of claim 1, wherein theinterface device isolation film comprises a gap-fill insulating film andan insulating liner surrounding the gap-fill insulating film, and theinsulating liner comprises a protruding portion extending long in thehorizontal direction at a same level as the level of the thinner finportion and protruding toward the side wall of the interface deviceisolation film.
 3. The integrated circuit device of claim 1, furthercomprising: a gate dielectric film provided between the plurality ofactive areas and the conductive lines, wherein the gate dielectric filmcomprises a first portion contacting the thinner fin portion, a secondportion contacting an upper surface of the fin body portion, and a thirdportion contacting the device isolation film.
 4. The integrated circuitdevice of claim 1, wherein the peripheral circuit area includes anactive area having a side wall in which a lateral recess at the samelevel as a level of the thinner fin portion is formed.
 5. The integratedcircuit device of claim 1, wherein the peripheral circuit area includesan active area having a side wall in which a lateral recess at a samelevel as a level of the thinner fin portion is formed, and the laterallyprotruding insulation portion protrudes toward the lateral recess.
 6. Anintegrated circuit device comprising: a substrate having a cell arrayarea, a peripheral circuit area, and an interface area between the cellarray area and the peripheral circuit area; a plurality of active areasin the substrate in the cell array area; a device isolation filmcovering a side wall of each of the plurality of active areas in thecell array area; an interface device isolation film filling an interfacetrench formed in the substrate in the interface area; a plurality ofconductive lines extending in the cell array area across the pluralityof active areas in a first direction; and gate dielectric films providedbetween the plurality of active areas and the plurality of conductivelines, wherein each of the plurality of active areas comprises a finbody portion located under the conductive lines and a thinner finportion protruding from the fin body portion toward the conductive lineand having a first width less than a second width of the fin bodyportion in the first direction, wherein each of the gate dielectricfilms comprises a first portion contacting the thinner fin portion, asecond portion contacting an upper surface of the fin body portion, anda third portion contacting the device isolation film, and wherein eachof the plurality of active areas further comprises an upper active areabetween two neighbouring conductive lines of the plurality of conductivelines, the upper active area having an uppermost surface at a levelhigher than a top surface of the plurality of conductive lines, and amiddle active area connected between the fin body portion and the upperactive area and having a third width less than the second width of thefin body portion and less than a fourth width of the upper active areain the first direction.
 7. The integrated circuit device of claim 6,wherein each of the plurality of conductive lines comprises a firstportion facing the thinner fin portion, a second portion facing theupper surface of the fin body portion, and a third portion facing thedevice isolation film.
 8. The integrated circuit device of claim 6,wherein each of the plurality of active areas has a side wall in which alateral recess is formed, the lateral recess extending long in ahorizontal direction at a same level as a level of the thinner finportion.
 9. The integrated circuit device of claim 6, wherein the deviceisolation film has a side wall on which a laterally protrudinginsulation portion is located, the laterally protruding insulationportion extending long in a horizontal direction at a same level as alevel of the thinner fin portion.
 10. The integrated circuit device ofclaim 6, wherein each of the plurality of conductive lines comprises arecess bottom that surrounds the thinner fin portion.
 11. An integratedcircuit device comprising: a substrate having a cell array area, aperipheral circuit area, and an interface area between the cell arrayarea and the peripheral circuit area; a plurality of active areas in thesubstrate in the cell array area; a device isolation film covering aside wall of each of the plurality of active areas in the cell arrayarea; an interface device isolation film filling an interface trenchformed in the substrate in the interface area; and a plurality ofconductive lines extending in the cell array area across the pluralityof active areas in a first direction, wherein each of the plurality ofactive areas comprises a fin body portion located under the conductivelines and a thinner fin portion protruding from the fin body portiontoward the conductive line and having a first width less than a secondwidth of the fin body portion in the first direction, and wherein theperipheral circuit area includes an active area having a side wall inwhich a lateral recess at a same level as a level of the thinner finportion is formed.
 12. The integrated circuit device of claim 11,wherein each of the plurality of active areas further comprises an upperactive area having an uppermost surface at a level higher than a topsurface of the plurality of conductive lines, and a middle active areaconnected between the fin body portion and the upper active area andhaving a third width less than the second width of the fin body portionand less than a fourth width of the upper active area in the firstdirection.
 13. The integrated circuit device of claim 11, furthercomprising: a gate trench extending in the first direction across theplurality of active areas and the device isolation film, the pluralityof conductive lines filling a part of the gate trench, wherein the gatetrench comprises a first bottom where the device isolation film isexposed and a second bottom where the thinner fin portion and the finbody portion are exposed, and the first bottom is at a level lower thanthe second bottom.
 14. The integrated circuit device of claim 11,wherein each of the plurality of conductive lines comprises a recessbottom that surrounds the thinner fin portion.
 15. The integratedcircuit device of claim 11, wherein each of the plurality of activeareas has a side wall including a lateral recess at a same level as thethinner fin portion, and wherein the device isolation film has a sidewall including a laterally protruding insulation portion that protrudestoward the lateral recess.
 16. The integrated circuit device of claim11, wherein each of the plurality of active areas has a side wallincluding a lateral recess extending long in a horizontal direction. 17.The integrated circuit device of claim 11, wherein each of the pluralityof active areas further comprises an upper active area having anuppermost surface at a level higher than a top surface of the pluralityof conductive lines, and a middle active area connected between the finbody portion and the upper active area, and wherein the middle activearea and the thinner fin portion are at a same level in a horizontaldirection.
 18. The integrated circuit device of claim 11, wherein a sidewall of the device isolation film includes a portion having a negativeprofile extending such that a width of the device isolation film in ahorizontal direction decreases toward an uppermost surface of theplurality of active areas.
 19. The integrated circuit device of claim11, wherein each of the plurality of active areas has a side wallincluding a lateral recess extending long in a horizontal direction, andthe device isolation film has a side wall including a laterallyprotruding insulation portion that protrudes toward the lateral recess,and wherein the device isolation film comprises a gap-fill insulatingfilm and an insulating liner that surrounds the gap-fill insulatingfilm, the insulating liner comprising a protruding portion thatprotrudes toward the laterally protruding insulation portion.